Our product?

Ultrapure water equipment
for nanoelectronics

MEETINGS

Our technology?

Simple and Unique!

Our goal:

Point-of-use - on demand
Ultrapure Water

Our advantage:

Purest water!

Xzero has developed a proprietary compact system for the production of Ultra-Pure Water.

All substances, for example Silica, Boron,Arsenic and nanoparticles, are separated.

Xzero has developed a proprietary compact system for the production of Ultra-Pure Water.

All substances, for example Silica, Boron,Arsenic and nanoparticles, are separated.

No chemicals used

In the core module, Xzero uses water repellent (hydrophobic) membranes as a barrier for contaminants.

All contaminants are removed

Contaminant that other systems may find difficult to remove, such as silica, TOC, arsenic, boron and the smallest nanoparticles are completely removed

No pressure no high temperatures

The process takes place at temperatures below 100°C
and at ambient pressure.

Lower cost

The capital cost is lower than for state-of-the art equipment. Since the process is powered by low-temperature heat, also the operating cost is significantly lower.

No chemicals used

In the core module, Xzero uses water repellent (hydrophobic) membranes as a barrier for contaminants.

All contaminants are removed

Contaminant that other systems may find difficult to remove, such as silica, TOC, arsenic, boron and the smallest nanoparticles are completely removed

No pressure no high temperatures

The process takes place at temperatures below 100°C
and at ambient pressure.

Lower cost

The capital cost is lower than for state-of-the art equipment. Since the process is powered by low-temperature heat, also the operating cost is significantly lower.

No chemicals used

In the core module, Xzero uses water repellent (hydrophobic) membranes as a barrier for contaminants.

All contaminants are removed

Contaminant that other systems may find difficult to remove, such as silica, TOC, arsenic, boron and the smallest nanoparticles are completely removed

No pressure no high temperatures

The process takes place at temperatures below 100°C
and at ambient pressure.

Lower cost

The capital cost is lower than for state-of-the art equipment. Since the process is powered by low-temperature heat, also the operating cost is significantly lower.

Meetings

Xzero technology

An early version of our technology is explained in a leading scientific journal for Ultrapure Water.

Impact Xzero

Xzero has developed technology for water treatment in the nanoelectronics industry which opens the door to further miniaturization of the technology.

Executives

  • Håkan Klingén
    Håkan Klingén Board Member
  • Vinay Chand
    Vinay Chand CEO
  • Aapo Sääsk
    Aapo Sääsk Chairman
  • Miriam Åslin
    Miriam Åslin Project Manager
  • Henrik Unné
    Henrik Unné Board Member

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Scarab Group

Meetings